reactive-ion beam

пучок хімічно активних іонів

English-Ukrainian dictionary of microelectronics. 2013.

Смотреть что такое "reactive-ion beam" в других словарях:

  • reactive-ion beam — reaktyviųjų jonų pluoštas statusas T sritis radioelektronika atitikmenys: angl. reactive ion beam vok. reaktiver Ionenstahl, m rus. пучок химически активных ионов, m pranc. faisceau d ions réactifs, m …   Radioelektronikos terminų žodynas

  • reactive ion-beam etching — reaktyvusis jonpluoštis ėsdinimas statusas T sritis radioelektronika atitikmenys: angl. reactive ion beam etching vok. reaktives Ionenstrahlätzen, n rus. реактивное ионно пучковое травление, n pranc. décapage par faisceau d ions réactifs, m …   Radioelektronikos terminų žodynas

  • reactive ion-beam oxidation — reaktyvusis jonpluoštis oksidavimas statusas T sritis radioelektronika atitikmenys: angl. reactive ion beam oxidation vok. reaktive Ionenstrahloxydation, f rus. реактивное ионно пучковое оксидирование, n pranc. oxydation par faisceau d ions… …   Radioelektronikos terminų žodynas

  • Ion-beam sculpting — Ion Beam scultping is a term used to describe a two step process to make solid state nanopores. The term itself was coined by Golovchenko and co workers at Harvard in the paper Ion beam sculpting at nanometer length scales [J. Li, D. Stein, C.… …   Wikipedia

  • Ion beam — An ion beam is a type of particle beam consisting of ions. Ion beams have many uses in electronics manufacturing (principally ion implantation) and other industries. Today s ion beam sources are typically derived from the mercury vapor thrusters… …   Wikipedia

  • Deep reactive-ion etching — (DRIE) is a highly anisotropic etch process used to create deep penetration, steep sided holes and trenches in wafers, with aspect ratios of 20:1 or more. It was developed for microelectromechanical systems (MEMS), which require these features,… …   Wikipedia

  • Gas cluster ion beam — Gas Cluster Ion Beams (GCIB) is a new technology for nano scale modification of surfaces. It can smooth a wide variety of surface material types to within an angstrom of roughness without subsurface damage. It is also used to chemically alter… …   Wikipedia

  • Ion plating — is a physical vapor deposition (PVD) process that is sometimes called ion assisted deposition (IAD) or ion vapor deposition (IVD) and is a version of vacuum deposition . Ion plating utilizes concurrent or periodic bombardment of the substrate and …   Wikipedia

  • Ion source — An ion source is an electro magnetic device that is used to create charged particles. These are used primarily within mass spectrometers or particle accelerators.Mass spectrometry In mass spectrometry, an ion source is a piece of equipment used… …   Wikipedia

  • Ion — Cation and Anion redirect here. For the particle physics/quantum computing concept, see Anyon. For other uses, see Ion (disambiguation). Hydrogen atom (center) contains a single proton and a single electron. Removal of the electron gives a cation …   Wikipedia

  • Electron beam physical vapor deposition — or EBPVD is a form of physical vapor deposition in which a target anode is bombarded with an electron beam given off by a charged tungsten filament under high vacuum. The electron beam causes atoms from the target to transform into the gaseous… …   Wikipedia

Книги


Поделиться ссылкой на выделенное

Прямая ссылка:
Нажмите правой клавишей мыши и выберите «Копировать ссылку»

We are using cookies for the best presentation of our site. Continuing to use this site, you agree with this.